Publication:

Catalyst assisted low temperature pre epitaxial cleaning for Si and SiGe surfaces

Date

2015
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorDhayalan, Sathish Kumar
dc.contributor.authorLoo, Roger
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorRosseel, Erik
dc.contributor.authorWostyn, Kurt
dc.contributor.authorKenis, Karine
dc.contributor.authorShimura, Yosuke
dc.contributor.authorProfijt, Harald
dc.contributor.authorMaes, Jan
dc.contributor.authorDouhard, Bastien
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.date.accessioned2021-10-22T19:03:08Z
dc.date.available2021-10-22T19:03:08Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25211
dc.identifier.urlhttp://www.scientific.net/SSP.219.16
dc.source.beginpage16
dc.source.conferenceUltraclean Processing of Semiconductor Surfaces XII
dc.source.conferencedate21/09/2014
dc.source.conferencelocationBrussels Belgium
dc.source.endpage19
dc.title

Catalyst assisted low temperature pre epitaxial cleaning for Si and SiGe surfaces

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
29577.pdf
Size:
75.63 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions