Publication:

Optimization of scatterometry parameters for shallow trench isolation (STI) monitor

Date

2004
Proceedings Paper
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dc.contributor.authorLeray, Philippe
dc.contributor.authorCheng, Shaunee
dc.contributor.authorKremer, Stephanie
dc.contributor.authorErcken, Monique
dc.contributor.authorPollentier, Ivan
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.accessioned2021-10-15T14:25:00Z
dc.date.available2021-10-15T14:25:00Z
dc.date.embargo9999-12-31
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9190
dc.source.beginpage576
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XVIII
dc.source.conferencedate22/02/2004
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage586
dc.title

Optimization of scatterometry parameters for shallow trench isolation (STI) monitor

dc.typeProceedings paper
dspace.entity.typePublication
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