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Investigation of the performance of state-of-the-art defect inspection tools within EUV lithography

Date

2012
Proceedings Paper
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dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorJonckheere, Rik
dc.contributor.authorCheng, Shaunee
dc.contributor.authorMarcuccilli, Gino
dc.contributor.authorCross, Andrew
dc.contributor.authorInderhees, Greg
dc.contributor.authorParisi, Paolo
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorCross, Andrew
dc.contributor.imecauthorParisi, Paolo
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2021-10-20T17:35:37Z
dc.date.available2021-10-20T17:35:37Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21689
dc.source.beginpage83240L
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXVI
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
dc.title

Investigation of the performance of state-of-the-art defect inspection tools within EUV lithography

dc.typeProceedings paper
dspace.entity.typePublication
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