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Overcoming the quantification barrier in reverse tip sample scanning spreading resistance microscopy for efficient nanoscale carrier profiling

 
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cris.virtual.orcid0000-0003-3734-7203
cris.virtual.orcid0000-0001-9476-4084
cris.virtual.orcid0000-0002-6730-9542
cris.virtual.orcid0009-0005-1291-332X
cris.virtualsource.department3a1e9951-0801-4bb0-85e5-4fdda408fd32
cris.virtualsource.departmente754b012-c4f4-4d96-8cf4-048fae6e57b3
cris.virtualsource.department469e1399-f329-43a3-99ac-ef37c3eda6d3
cris.virtualsource.departmentc7699ea4-eb53-43b6-9348-76598ac86ec1
cris.virtualsource.orcid3a1e9951-0801-4bb0-85e5-4fdda408fd32
cris.virtualsource.orcide754b012-c4f4-4d96-8cf4-048fae6e57b3
cris.virtualsource.orcid469e1399-f329-43a3-99ac-ef37c3eda6d3
cris.virtualsource.orcidc7699ea4-eb53-43b6-9348-76598ac86ec1
dc.contributor.authorLagrain, Pieter
dc.contributor.authorPeric, Nemanja
dc.contributor.authorWouters, Lennaert
dc.contributor.authorHantschel, Thomas
dc.date.accessioned2026-09-17T09:32:12Z
dc.date.available2026-09-17T09:32:12Z
dc.date.createdwos2026
dc.date.issued2026
dc.description.abstractAbstract The quick tip exchange capability of reverse tip sample (RTS) scanning probe microscopy (SPM) provides significant efficiency benefits over conventional SPM, especially in highforce modes like scanning spreading resistance microscopy (SSRM). While prior developments in RTS SSRM have addressed conductive diamond probe chip fabrication, sample preparation for electrical SPM measurements, and qualitative measurement capabilities, the challenge of achieving quantitative carrier profiling remained unresolved, primarily due to focused ion beam (FIB) damage that is introduced during RTS sample preparation. In this work, we present two different FIB-based RTS sample preparation protocols for mounting multiple samples on a single tipless cantilever. The core postulation is that co-mounting the target and calibration samples together ensures that they undergo identical ion beam exposure, thereby enabling accurate SSRM quantification. The first protocol employs sequential mounting of individual samples, while the second involves bonding the samples together, polishing their surfaces, and then, mounting them as a single, unified assembly. It is also worth noting that the latter protocol supports a sample layout that enables quantitative analysis to be done on each individual scanline, which can reduce the impact of measurement artefacts resulting from tip degradation or just unstable tip-sample contact during scanning. Quantitative validation of RTS SSRM for both preparation protocols was accomplished by implementing two different staircase calibration samples, comprised of layers having well-defined carrier concentrations. Finally, mounting a calibration sample alongside an actual device sample confirmed that RTS SSRM delivers results equivalent to those obtained with conventional SSRM, affirming its quantification reliability for practical applications. By establishing quantitative SSRM in RTS configuration, this work addresses a critical gap and further positions RTS SPM as a valuable approach for advancing electrical SPM characterization.
dc.description.wosFundingTextThis work was done in the imec IIAP core CMOS programs. We acknowledge the imec epi team for providing the calibration samples used to develop and validate the quantitative RTS SSRM. We acknowledge the support provided by Bruker Corporation in the framework of an imec-Bruker joint development project on the development of RTS SPM.
dc.identifier.doi10.1088/1361-6528/ae7707
dc.identifier.eissn1361-6528
dc.identifier.issn0957-4484
dc.identifier.pmidMEDLINE:42233763
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/60402
dc.language.isoeng
dc.provenance.editstepusergreet.vanhoof@imec.be
dc.publisherIOP Publishing Ltd
dc.source.beginpage245701
dc.source.issue24
dc.source.journalNANOTECHNOLOGY
dc.source.numberofpages9
dc.source.volume37
dc.subject.keywordsINDUCED LATERAL DAMAGE
dc.subject.keywordsSILICON
dc.subject.keywordsSSRM
dc.title

Overcoming the quantification barrier in reverse tip sample scanning spreading resistance microscopy for efficient nanoscale carrier profiling

dc.typeJournal article
dspace.entity.typePublication
imec.internal.crawledAt2026-06-04
imec.internal.sourcecrawler
imec.internal.wosCreatedAt2026-09-07
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