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Vapor phase doping and sub-melt laser anneal for ultra-shallow extension junctions in sub-32 nm CMOS technology
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1 since deposited on 2021-10-18
Acq. date: 2026-02-26
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1858 since deposited on 2021-10-18
Acq. date: 2026-02-26
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1 since deposited on 2021-10-18
Acq. date: 2026-02-26
Views
1858 since deposited on 2021-10-18
Acq. date: 2026-02-26
Citations