Publication:

Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?

Date

2018
Journal article
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dc.contributor.authorErdmann, Andreas
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorMesilhy, Hazem
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHendrickx, Eric
dc.contributor.authorBauer, Markus
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2021-10-25T18:30:08Z
dc.date.available2021-10-25T18:30:08Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30681
dc.identifier.urlhttps://doi.org/10.1117/1.JMM.18.1.011005
dc.source.beginpage11005
dc.source.issue1
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.volume18
dc.title

Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?

dc.typeJournal article
dspace.entity.typePublication
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