Publication:

Substrate dependence of ruthenium atomic layer deposition

Date

2017
Meeting abstract
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dc.contributor.authorSoethoudt, Job
dc.contributor.authorTomczak, Yoann
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorDelabie, Annelies
dc.contributor.imecauthorSoethoudt, Job
dc.contributor.imecauthorTomczak, Yoann
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-24T13:54:50Z
dc.date.available2021-10-24T13:54:50Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29472
dc.identifier.urlhttp://www.nanomanufacturing.nl/ASD2017/programbook.pdf
dc.source.conference2nd Area Selective Deposition Workshop - ASD
dc.source.conferencedate20/02/2017
dc.source.conferencelocationEindhoven The Netherlands
dc.title

Substrate dependence of ruthenium atomic layer deposition

dc.typeMeeting abstract
dspace.entity.typePublication
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