Publication:

Soft X-Ray Absorption Spectroscopy Investigation of HfO<sub>2</sub> and ZrO<sub>2</sub> Thin Films with Modulated Crystalline Phase by Varying Dopants (Al, Si, Gd) for Ferroelectric and High-<i>k</i> Dielectric Applications

Date

2025-MAR 6
Journal article
https://doi.org/10.1002/pssr.202400385
Simple item page Full metadata Statistics
 
dc.contributor.authorKim, Hyun-Cheol
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorHerrero-Martin, Javier
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorDekkers, Harold
dc.contributor.authorKwon, Dae Seon
dc.contributor.authorVan Houdt, Jan
dc.contributor.imecauthorKim, Hyun-Cheol
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorKwon, Dae Seon
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.orcidimecPopovici, Mihaela Ioana::0000-0002-9838-1088
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.date.accessioned2025-03-14T18:11:33Z
dc.date.available2025-03-14T18:11:33Z
dc.date.issued2025-MAR 6
dc.description.wosFundingTextThis work was performed under IMEC's affiliation program on active memory. The XAS measurements were performed under ALBA synchrotron BOREAS beamline (Barcelona, Spain) under the supervision of Dr. Javier Herrero-Martin within the project: 2017092463-Soft X-ray absorption spectroscopy (XAS) investigation of doped HfO2 thin films with orthorhombic phase. The GIXRD was performed at Elletra synchrotron Trieste MCX beamline, under the project 20170065 Investigation of the orthorhombic phase formation in doped hafnium oxide for ferroelectric field effect transistor applications, for which the contribution of beamline scientists Dr. Jasper Plaisier and Dr. Lara Gigli is kindly acknowledged. The authors thank C. Adelmann and S. McMitchell for the useful discussion and for helping with the XAS measurements at Alba synchrotron.
dc.identifier.doi10.1002/pssr.202400385
dc.identifier.issn1862-6254
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45396
dc.publisherWILEY-V C H VERLAG GMBH
dc.source.journalPHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS
dc.source.numberofpages7
dc.title

Soft X-Ray Absorption Spectroscopy Investigation of HfO2 and ZrO2 Thin Films with Modulated Crystalline Phase by Varying Dopants (Al, Si, Gd) for Ferroelectric and High-k Dielectric Applications

dc.typeJournal article
dspace.entity.typePublication
Files
Publication available in collections:
Articles