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A novel concept for contact etch residue removal
Publication:
A novel concept for contact etch residue removal
Date
2007
Proceedings Paper
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15534.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vos, Ingrid
;
Hellin, David
;
Demuynck, Steven
;
Richard, Olivier
;
Conard, Thierry
;
Vertommen, Johan
;
Boullart, Werner
Journal
Abstract
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1988
since deposited on 2021-10-16
Acq. date: 2025-10-22
Citations
Metrics
Views
1988
since deposited on 2021-10-16
Acq. date: 2025-10-22
Citations