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Photo-responsive oligo(dimethylsiloxane) liquid crystals for defect-free nano-patterning at the sub-5 nm scale
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Photo-responsive oligo(dimethylsiloxane) liquid crystals for defect-free nano-patterning at the sub-5 nm scale
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Date
2016
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Nickmans, K.
;
Murphy, J.
;
De Waal, B.
;
Leclere, P.
;
Sanchez Somolinos, C.
;
Doise, Jan
;
Gronheid, Roel
;
Broer, D.
;
Schenning, A.
Journal
Advanced Materials
Abstract
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1830
since deposited on 2021-10-23
Acq. date: 2025-12-16
Citations
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Views
1830
since deposited on 2021-10-23
Acq. date: 2025-12-16
Citations