Publication:

Processing damage and electrical performance of porous dielectrics in narrow spaced interconnects

Date

2004
Proceedings Paper
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dc.contributor.authorIacopi, Francesca
dc.contributor.authorTravaly, Youssef
dc.contributor.authorStucchi, Michele
dc.contributor.authorStruyf, Herbert
dc.contributor.authorPeeters, Stefan
dc.contributor.authorJonckheere, Rik
dc.contributor.authorLeunissen, Peter
dc.contributor.authorTokei, Zsolt
dc.contributor.authorSutcliffe, Victor
dc.contributor.authorRichard, Olivier
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorPeeters, Stefan
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.accessioned2021-10-15T14:01:18Z
dc.date.available2021-10-15T14:01:18Z
dc.date.embargo9999-12-31
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9085
dc.source.beginpage19
dc.source.conferenceMaterials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics
dc.source.conferencedate12/04/2004
dc.source.conferencelocationSan Francisco, CA USA
dc.source.endpage24
dc.title

Processing damage and electrical performance of porous dielectrics in narrow spaced interconnects

dc.typeProceedings paper
dspace.entity.typePublication
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