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A wafer-scaled III-V vertical FET fabrication by means of plasma etching

Date

2018
Journal article
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dc.contributor.authorMilenin, Alexey
dc.contributor.authorVeloso, Anabela
dc.contributor.authorCollaert, Nadine
dc.contributor.authorPiumi, Daniele
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorPiumi, Daniele
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.accessioned2021-10-25T23:28:35Z
dc.date.available2021-10-25T23:28:35Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31344
dc.identifier.urlhttps://authors.elsevier.com/a/1WXUqcBkcQdF5
dc.source.beginpage14
dc.source.endpage18
dc.source.journalMicroelectronic Engineering
dc.source.volume192
dc.title

A wafer-scaled III-V vertical FET fabrication by means of plasma etching

dc.typeJournal article
dspace.entity.typePublication
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