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Active area oxidation during the densification of shallow trench isolation for sub-0.25 micron CMOS
Publication:
Active area oxidation during the densification of shallow trench isolation for sub-0.25 micron CMOS
Date
1998
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Bazley, D. J.
;
Jones, S. K.
;
Badenes, Gonçal
Journal
Abstract
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2002
since deposited on 2021-09-30
Acq. date: 2025-10-23
Citations
Metrics
Views
2002
since deposited on 2021-09-30
Acq. date: 2025-10-23
Citations