Overlay Metrology Performance of Dry Photoresist Towards High NA EUV Lithography

Canga, Eren; Blanco, Victor; Charley, Anne-Laure; Tabery, Cyrus; Zacca, Gabriel; Shamma, Nader; Kam, Benjamin; Brouri, Mohand

doi:10.1117/12.3010115

Publication:

Overlay Metrology Performance of Dry Photoresist Towards High NA EUV Lithography

Date

2024

Proceedings Paper

https://doi.org/10.1117/12.3010115

Simple item page Full metadata Statistics

Files

Published version 655.2 KB

Author(s)

;

;

;

;

;

;

;

Journal

Proceedings of SPIE

Statistics

465 since deposited on 2024-06-15

33last month

9last week

Acq. date: 2026-02-24

638 since deposited on 2024-06-15

Acq. date: 2026-02-24

Overlay Metrology Performance of Dry Photoresist Towards High NA EUV Lithography

Date

Files

Author(s)

Journal

Abstract

Description

Statistics

Downloads

Views

Citations

Statistics

Downloads

Views

Citations