Publication:
The potential of double patterning immersion lithography for the 32nm half pitch node
Date
| dc.contributor.author | Wiaux, Vincent | |
| dc.contributor.author | Storms, Greet | |
| dc.contributor.author | Cheng, Shaunee | |
| dc.contributor.author | Maenhoudt, Mireille | |
| dc.contributor.imecauthor | Wiaux, Vincent | |
| dc.date.accessioned | 2021-10-16T21:43:21Z | |
| dc.date.available | 2021-10-16T21:43:21Z | |
| dc.date.issued | 2007-08 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13224 | |
| dc.identifier.url | semi.org.cn | |
| dc.source.beginpage | 21 | |
| dc.source.endpage | 24 | |
| dc.source.journal | Semiconductor-Manufacturing-Magazine-SEMI-China | |
| dc.title | The potential of double patterning immersion lithography for the 32nm half pitch node | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |