Publication:

Reliability in stacked Gate-All-Around Si nanowire devices: time dependent variability and full degradation mapping

Date

 
dc.contributor.authorVaisman Chasin, Adrian
dc.contributor.authorBury, Erik
dc.contributor.authorFranco, Jacopo
dc.contributor.authorKaczer, Ben
dc.contributor.authorRzepa, Gerhard
dc.contributor.authorPutcha, Vamsi
dc.contributor.authorWeckx, Pieter
dc.contributor.authorRitzenthaler, Romain
dc.contributor.authorMertens, Hans
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorLinten, Dimitri
dc.contributor.imecauthorVaisman Chasin, Adrian
dc.contributor.imecauthorBury, Erik
dc.contributor.imecauthorFranco, Jacopo
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorPutcha, Vamsi
dc.contributor.imecauthorWeckx, Pieter
dc.contributor.imecauthorRitzenthaler, Romain
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorLinten, Dimitri
dc.contributor.orcidimecVaisman Chasin, Adrian::0000-0002-9940-0260
dc.contributor.orcidimecBury, Erik::0000-0002-5847-3949
dc.contributor.orcidimecFranco, Jacopo::0000-0002-7382-8605
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecPutcha, Vamsi::0000-0003-1907-5486
dc.contributor.orcidimecRitzenthaler, Romain::0000-0002-8615-3272
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecLinten, Dimitri::0000-0001-8434-1838
dc.date.accessioned2021-10-26T06:15:08Z
dc.date.available2021-10-26T06:15:08Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31998
dc.source.conferenceTaiwan ESD and Reliability Conference (TESDC-2018)
dc.source.conferencedate7/11/2018
dc.source.conferencelocationHsinchu Taiwan
dc.title

Reliability in stacked Gate-All-Around Si nanowire devices: time dependent variability and full degradation mapping

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections: