Publication:

Atomic layer deposition of tantalum oxide and tantalum silicate from chloride precursors

Date

2012

Journal article

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Author(s)

Adelmann, Christoph

;

Delabie, Annelies

;

;

Rodriguez, Leonard

;

Franquet, Alexis

;

Conard, Thierry

;

;

;

;

Pourtois, Geoffrey

;

Pierloot, Christine

;

;

Van Elshocht, Sven

Journal

Chemical Vapor Deposition

Metrics

1993 since deposited on 2021-10-20

Acq. date: 2025-12-12