Publication:
Secondary electron distribution and photosensitivity performance of resists for extreme ultraviolet (EUV)
Date
| dc.contributor.author | Rezvani, Javid | |
| dc.contributor.author | Tchoudinov, Georghii | |
| dc.contributor.author | Nannarone, Stefano | |
| dc.contributor.author | Fallica, Roberto | |
| dc.contributor.imecauthor | Fallica, Roberto | |
| dc.contributor.orcidimec | Fallica, Roberto::0000-0003-4523-9624 | |
| dc.date.accessioned | 2022-05-06T09:22:06Z | |
| dc.date.available | 2022-04-15T12:01:10Z | |
| dc.date.available | 2022-05-06T09:22:06Z | |
| dc.date.issued | 2022-03-17 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39628 | |
| dc.source.conference | CECAM | |
| dc.source.conferencedate | 2022-03-17 | |
| dc.source.conferencelocation | Lausanne | |
| dc.subject.discipline | Applied physics | |
| dc.title | Secondary electron distribution and photosensitivity performance of resists for extreme ultraviolet (EUV) | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |