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Plasma enhanced atomic layer deposition of ruthenium ultra-thin films for advanced metallization
Publication:
Plasma enhanced atomic layer deposition of ruthenium ultra-thin films for advanced metallization
Date
2010
Meeting abstract
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Swerts, Johan
;
Armini, Silvia
;
Carbonell, Laure
;
Delabie, Annelies
;
Franquet, Alexis
;
Mertens, Sofie
;
Schaekers, Marc
;
Witters, Thomas
;
Tokei, Zsolt
;
Beyer, Gerald
;
Van Elshocht, Sven
;
Gravey, Virginie
;
Cockburn, Andrew
;
Shah, Kavita
;
Aubuchon, Joseph
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1891
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations
Metrics
Views
1891
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations