Publication:

Metal interactions with silica (SiO2) surfaces: adsorption and ion exchange

Date

1996
Proceedings Paper
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dc.contributor.authorHurd, Trace
dc.contributor.authorSchmidt, Harald
dc.contributor.authorRotondaro, Antonio
dc.contributor.authorMertens, Paul
dc.contributor.authorHall, L. H.
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.date.accessioned2021-09-29T14:34:48Z
dc.date.available2021-09-29T14:34:48Z
dc.date.embargo9999-12-31
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1266
dc.source.beginpage277
dc.source.conferenceProceedings of the Fourth International Symposium on Cleaning technology in Semiconductor Device Manufacturing
dc.source.conferencedate9/10/1995
dc.source.conferencelocationChicago, IL USA
dc.source.endpage283
dc.title

Metal interactions with silica (SiO2) surfaces: adsorption and ion exchange

dc.typeProceedings paper
dspace.entity.typePublication
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