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Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects

Date

2011
Proceedings Paper
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dc.contributor.authorErdmann, Andreas
dc.contributor.authorShao, Feng
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorFuehner, Tim
dc.contributor.authorLorusso, Gian
dc.contributor.authorHendrickx, Eric
dc.contributor.authorGoethals, Mieke
dc.contributor.authorJonckheere, Rik
dc.contributor.authorBret, Tristan
dc.contributor.authorHofmann, Thorsten
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2021-10-19T13:27:09Z
dc.date.available2021-10-19T13:27:09Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18889
dc.source.beginpage81710M
dc.source.conferencePhysical Optics
dc.source.conferencedate5/09/2011
dc.source.conferencelocationMarseille France
dc.title

Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects

dc.typeProceedings paper
dspace.entity.typePublication
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