Electroless copper bath stability monitoring with UV-VIS spectroscopy, pH, and mixed potential measurements

dc.contributor.author	Inoue, Fumihiro
dc.contributor.author	Philipsen, Harold
dc.contributor.author	Radisic, Alex
dc.contributor.author	Armini, Silvia
dc.contributor.author	Civale, Yann
dc.contributor.author	Shingubara, Shoso
dc.contributor.author	Leunissen, Peter
dc.contributor.imecauthor	Inoue, Fumihiro
dc.contributor.imecauthor	Philipsen, Harold
dc.contributor.imecauthor	Radisic, Alex
dc.contributor.imecauthor	Armini, Silvia
dc.contributor.orcidimec	Philipsen, Harold::0000-0002-5029-1104
dc.contributor.orcidimec	Armini, Silvia::0000-0003-0578-3422
dc.date.accessioned	2021-10-20T11:48:07Z
dc.date.available	2021-10-20T11:48:07Z
dc.date.issued	2012
dc.identifier.issn	0013-4651
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/20848
dc.identifier.url	http://dx.doi.org/10.1149/2.070207jes
dc.source.beginpage	D437
dc.source.endpage	D441
dc.source.issue	7
dc.source.journal	Journal of the Electrochemical Society
dc.source.volume	159
dc.title	Electroless copper bath stability monitoring with UV-VIS spectroscopy, pH, and mixed potential measurements
dc.type	Journal article
dspace.entity.type	Publication
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