Publication:

Si versus Ge for future microelectronics

Date

2010
Journal article
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dc.contributor.authorClaeys, Cor
dc.contributor.authorMitard, Jerome
dc.contributor.authorEneman, Geert
dc.contributor.authorMeuris, Marc
dc.contributor.authorSimoen, Eddy
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.accessioned2021-10-18T15:38:21Z
dc.date.available2021-10-18T15:38:21Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.issn0040-6090
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16887
dc.source.beginpage2301
dc.source.endpage2306
dc.source.issue9
dc.source.journalThin Solid Films
dc.source.volume518
dc.title

Si versus Ge for future microelectronics

dc.typeJournal article
dspace.entity.typePublication
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