Publication:

Advanced wafer surface cleaning technology

Date

2004
Presentation
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dc.contributor.authorMertens, Paul
dc.contributor.authorVos, Rita
dc.contributor.authorVereecke, Guy
dc.contributor.authorArnauts, Sophia
dc.contributor.authorBearda, Twan
dc.contributor.authorDe Waele, Rita
dc.contributor.authorEitoku, Atsuro
dc.contributor.authorFyen, Wim
dc.contributor.authorGeckiere, J.
dc.contributor.authorHellin, David
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorKesters, Els
dc.contributor.authorClaes, Martine
dc.contributor.authorKenis, Karine
dc.contributor.authorKraus, Harald
dc.contributor.authorMalhouitre, Stephane
dc.contributor.authorLee, Kuntack
dc.contributor.authorKocsis, Michael
dc.contributor.authorOnsia, Bart
dc.contributor.authorGaraud, Sylvain
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorKocsis, Michael
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-15T14:51:44Z
dc.date.available2021-10-15T14:51:44Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9296
dc.source.conferenceSEMICON Korea 2004 STS, S5: Contamination-free Manufacturing Seminar
dc.source.conferencedate18/02/2004
dc.source.conferencelocationSeoul Korea
dc.title

Advanced wafer surface cleaning technology

dc.typeOral presentation
dspace.entity.typePublication
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