Publication:

Basic aspects of the formation and activation of boron junctions using plasma immersion ion implantation

Date

2008
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorZschaetzsch, Gerd
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorHoffmann, Thomas
dc.contributor.authorGoossens, Jozefien
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authordel Agua Borniquel, Jose Ignacio
dc.contributor.authorPoon, T.
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthordel Agua Borniquel, Jose Ignacio
dc.date.accessioned2021-10-17T13:15:45Z
dc.date.available2021-10-17T13:15:45Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14855
dc.source.beginpage464
dc.source.conference17th International Conference in Ion Implantation Technology - IIT
dc.source.conferencedate8/06/2008
dc.source.conferencelocationMonterey, CA USA
dc.source.endpage464
dc.title

Basic aspects of the formation and activation of boron junctions using plasma immersion ion implantation

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
16933.pdf
Size:
1.52 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions