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Impact of rapid thermal annealing of Ti/TiN bilayers on subsequent chemical vapor deposition of tungsten
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Impact of rapid thermal annealing of Ti/TiN bilayers on subsequent chemical vapor deposition of tungsten
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Date
1996
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Mouroux, Aliette
;
Palmans, Roger
;
Keinonen, J.
;
Zhang, S. L.
;
Maex, Karen
;
Petersson, S.
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1903
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Acq. date: 2025-12-09
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Views
1903
since deposited on 2021-09-29
3
last month
Acq. date: 2025-12-09
Citations