Publication:

EUV low-n attenuated phase-shift mask on random logic Via single patterning at pitch 36nm

Date

2022-05-26
Proceedings Paper
https://doi.org/10.1117/12.2614000
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dc.contributor.authorTan, Ling Ee
dc.contributor.authorGillijns, Werner
dc.contributor.authorLee, Jae Uk
dc.contributor.authorXu, Dongbo
dc.contributor.authorVan de Kerkhove, Jeroen
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorKim, Ryan Ryoung Han
dc.contributor.imecauthorTan, Ling Ee
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorLee, Jae Uk
dc.contributor.imecauthorXu, Dongbo
dc.contributor.imecauthorVan de Kerkhove, Jeroen
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.orcidimecTan, Ling Ee::0000-0002-3143-5176
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecLee, Jae Uk::0000-0002-9434-5055
dc.contributor.orcidimecXu, Dongbo::0000-0003-1159-2315
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecVan de Kerkhove, Jeroen::0009-0005-4824-0411
dc.date.accessioned2022-09-29T15:05:47Z
dc.date.available2022-09-19T02:51:15Z
dc.date.available2022-09-26T09:29:16Z
dc.date.available2022-09-29T15:05:47Z
dc.date.issued2022-05-26
dc.identifier.doi10.1117/12.2614000
dc.identifier.eisbn978-1-5106-4978-1
dc.identifier.isbn978-1-5106-4977-4
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40459
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage120510P
dc.source.conferenceConference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference
dc.source.conferencedateAPR 24-MAY 27, 2022
dc.source.conferencelocationSan Jose, California, United States
dc.source.journalProceedings of SPIE
dc.source.numberofpages18
dc.title

EUV low-n attenuated phase-shift mask on random logic Via single patterning at pitch 36nm

dc.typeProceedings paper
dspace.entity.typePublication
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