Publication:
Continuing degradation of the SiO2/Si interface after hot hole stress
Date
| dc.contributor.author | Al-Kofahi, I. S. | |
| dc.contributor.author | Zhang, Jenny | |
| dc.contributor.author | Groeseneken, Guido | |
| dc.contributor.imecauthor | Groeseneken, Guido | |
| dc.date.accessioned | 2021-09-30T07:54:39Z | |
| dc.date.available | 2021-09-30T07:54:39Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 1997 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/1694 | |
| dc.source.beginpage | 2686 | |
| dc.source.endpage | 2692 | |
| dc.source.issue | 6 | |
| dc.source.journal | Journal of Applied Physics | |
| dc.source.volume | 81 | |
| dc.title | Continuing degradation of the SiO2/Si interface after hot hole stress | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |