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Articles
Failure mechanisms of PVD Ta and ALD TaN barrier layers for Cu contact applications
Publication:
Failure mechanisms of PVD Ta and ALD TaN barrier layers for Cu contact applications
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Date
2007
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15357.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Zhao, Chao
;
Tokei, Zsolt
;
Haider, A.
;
Demuynck, Steven
Journal
Microelectronic Engineering
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1934
since deposited on 2021-10-16
Acq. date: 2025-12-15
Citations
Metrics
Views
1934
since deposited on 2021-10-16
Acq. date: 2025-12-15
Citations