Publication:

Analysis of plasma induced gate oxide damage in multi-level metal processing

Date

1998
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorYuan, Xiao Jie
dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorLietaer, Nicolas
dc.contributor.authorZagrebnov, Maxim
dc.contributor.authorDebusschere, Ingrid
dc.contributor.authorDeferm, Ludo
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorDebusschere, Ingrid
dc.contributor.imecauthorDeferm, Ludo
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.date.accessioned2021-10-01T09:51:28Z
dc.date.available2021-10-01T09:51:28Z
dc.date.embargo9999-12-31
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3166
dc.source.beginpage405
dc.source.conferenceProceedings 15th International VLSI Multilevel Interconnection Conference - VMIC
dc.source.conferencedate16/06/1998
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage409
dc.title

Analysis of plasma induced gate oxide damage in multi-level metal processing

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
2699.pdf
Size:
463.74 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions