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Newly developed positive-tone resists for Posi/Posi double patterning process
Publication:
Newly developed positive-tone resists for Posi/Posi double patterning process
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Date
2009
Proceedings Paper
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17914.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Nakamura, Tsuyoshi
;
Takeshita, Masaru
;
Maemori, Satoshi
;
Uchida, Ryusuke
;
Takasu, Ryoichi
;
Ohmori, Katsumi
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1940
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Acq. date: 2025-12-11
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Views
1940
since deposited on 2021-10-18
2
last month
Acq. date: 2025-12-11
Citations