Publication:

Newly developed positive-tone resists for Posi/Posi double patterning process

Date

2009

Proceedings Paper

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Files

17914.pdf 1.22 MB

Author(s)

Nakamura, Tsuyoshi

;

Takeshita, Masaru

;

Maemori, Satoshi

;

Uchida, Ryusuke

;

Takasu, Ryoichi

;

Ohmori, Katsumi

Statistics

1940 since deposited on 2021-10-18

Acq. date: 2026-01-27