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Articles
Mask effects on resist variability in extreme ultraviolet lithography
Publication:
Mask effects on resist variability in extreme ultraviolet lithography
Date
2013
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vaglio Pret, Alessandro
;
Gronheid, Roel
;
Engelen, Jan
;
Yan, Pei-Yang
;
Leeson, Michael
;
Younkin, Todd
;
Garidis, Kostas
;
Biafore, John
Journal
Japanese Journal of Applied Physics
Abstract
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1930
since deposited on 2021-10-21
Acq. date: 2025-10-23
Citations
Metrics
Views
1930
since deposited on 2021-10-21
Acq. date: 2025-10-23
Citations