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Mask effects on resist variability in extreme ultraviolet lithography
Publication:
Mask effects on resist variability in extreme ultraviolet lithography
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Date
2013
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vaglio Pret, Alessandro
;
Gronheid, Roel
;
Engelen, Jan
;
Yan, Pei-Yang
;
Leeson, Michael
;
Younkin, Todd
;
Garidis, Kostas
;
Biafore, John
Journal
Japanese Journal of Applied Physics
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1931
since deposited on 2021-10-21
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Acq. date: 2025-12-10
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Metrics
Views
1931
since deposited on 2021-10-21
1
last month
Acq. date: 2025-12-10
Citations