Publication:

High-contrast quantum-confined Stark effect in Ge/SiGe quantum well stacks on Si with ultra-thin buffer layers

Date

2018
Proceedings Paper
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dc.contributor.authorSrinivasan, Ashwyn
dc.contributor.authorPorret, Clément
dc.contributor.authorVissers, Ewoud
dc.contributor.authorGeiregat, Pieter
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorLoo, Roger
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorVan Campenhout, Joris
dc.contributor.imecauthorSrinivasan, Ashwyn
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorVissers, Ewoud
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecVissers, Ewoud::0000-0002-5765-0552
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.date.accessioned2021-10-26T04:33:51Z
dc.date.available2021-10-26T04:33:51Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31844
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8699598
dc.source.beginpageTh3C.1
dc.source.conference2018 Conference on Lasers and Electro-Optics Pacific Rim (CLEO-PR)
dc.source.conferencedate29/07/2018
dc.source.conferencelocationHong Kong Hong Kong
dc.title

High-contrast quantum-confined Stark effect in Ge/SiGe quantum well stacks on Si with ultra-thin buffer layers

dc.typeProceedings paper
dspace.entity.typePublication
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