Publication:

Fullerene based materials for ultra-low-k application

Date

2010
Proceedings Paper
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dc.contributor.authorBroczkowska, Katarzyna
dc.contributor.authorKlocek, Jolanta
dc.contributor.authorFriedrich, Daniel
dc.contributor.authorKolanek, Krzysztof
dc.contributor.authorUrbanowicz, Adam
dc.contributor.authorScheisser, Dieter
dc.contributor.authorMiller, Miroslaw
dc.contributor.authorZschech, Ehrenfried
dc.date.accessioned2021-10-18T15:26:47Z
dc.date.available2021-10-18T15:26:47Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16803
dc.identifier.urlhttp://www-old.wemif.pwr.wroc.pl/optoel/workshop2010/
dc.source.beginpage39
dc.source.conferenceInternational Students and Young Scientists Workshop 'Photonics and Microsystems'
dc.source.conferencedate25/06/2010
dc.source.conferencelocationSzklarska Poreba Poland
dc.source.endpage43
dc.title

Fullerene based materials for ultra-low-k application

dc.typeProceedings paper
dspace.entity.typePublication
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