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Impact of multiple sub-melt laser scans on the activation and diffusion of shallow Boron junctions

Date

2008
Proceedings Paper
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dc.contributor.authorRosseel, Erik
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorClarysse, Trudo
dc.contributor.authorGoossens, Jozefien
dc.contributor.authorMoussa, Alain
dc.contributor.authorLin, Rong
dc.contributor.authorPetersen, Dirch
dc.contributor.authorNielsen, Peter
dc.contributor.authorHansen, Otto
dc.contributor.authorBennett, Nick
dc.contributor.authorCowern, Nick
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorMoussa, Alain
dc.date.accessioned2021-10-17T10:16:48Z
dc.date.available2021-10-17T10:16:48Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14391
dc.source.beginpage135
dc.source.conference16th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP
dc.source.conferencedate30/09/2008
dc.source.conferencelocationLas Vegas, NV USA
dc.source.endpage140
dc.title

Impact of multiple sub-melt laser scans on the activation and diffusion of shallow Boron junctions

dc.typeProceedings paper
dspace.entity.typePublication
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