Publication:

Dopant segregation in Si and Ge CVD epitaxial growth

Date

2016-11
Meeting abstract
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dc.contributor.authorMurota, Junichi
dc.contributor.authorYamamoto, Yuchi
dc.contributor.authorCostina, Ioan
dc.contributor.authorTillack, Bernd
dc.contributor.authorLe Thanh, Vin
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-23T13:09:39Z
dc.date.available2021-10-23T13:09:39Z
dc.date.issued2016-11
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27061
dc.source.beginpage33
dc.source.conference8th International Workshop on Advanced Materials Science and Nanotechnology - IWAMSN
dc.source.conferencedate8/11/2016
dc.source.conferencelocationHa Long City Vietnam
dc.source.endpage34
dc.title

Dopant segregation in Si and Ge CVD epitaxial growth

dc.typeMeeting abstract
dspace.entity.typePublication
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