Electromigration threshold in damascene versus plasma-etched interconnects

dc.contributor.author	Proost, Joris
dc.contributor.author	Maex, Karen
dc.contributor.author	Delaey, L.
dc.contributor.imecauthor	Maex, Karen
dc.date.accessioned	2021-10-01T08:44:18Z
dc.date.available	2021-10-01T08:44:18Z
dc.date.embargo	9999-12-31
dc.date.issued	1998
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/2885
dc.source.beginpage	2748
dc.source.endpage	2750
dc.source.issue	19
dc.source.journal	Applied Physics Letters
dc.source.volume	73
dc.title	Electromigration threshold in damascene versus plasma-etched interconnects
dc.type	Journal article
dspace.entity.type	Publication
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