Publication:

Application of single-wafer wet cleaning prior to epitaxial SiGe process

Date

2009
Journal article
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dc.contributor.authorSano, Ken-Ichi
dc.contributor.authorWada, Masayuki
dc.contributor.authorLeys, Frederik
dc.contributor.authorLoo, Roger
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorMertens, Paul
dc.contributor.authorSnow, Jim
dc.contributor.authorIzumi, A.
dc.contributor.authorMiya, Katsuhiko
dc.contributor.authorEitoku, Atsuro
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.date.accessioned2021-10-18T02:36:03Z
dc.date.available2021-10-18T02:36:03Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.issn1662-9779
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16156
dc.source.beginpage173
dc.source.endpage176
dc.source.journalSolid State Phenomena
dc.source.volume145-146
dc.title

Application of single-wafer wet cleaning prior to epitaxial SiGe process

dc.typeJournal article
dspace.entity.typePublication
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