Chemical vapor deposition processes for the fabrication of epitaxial Si-O superlattices

dc.contributor.author	Jayachandran, Suseendran
dc.contributor.author	Delabie, Annelies
dc.contributor.author	Maggen, Jens
dc.contributor.author	Caymax, Matty
dc.contributor.author	Loo, Roger
dc.contributor.author	Meersschaut, Johan
dc.contributor.author	Lenka, Hara
dc.contributor.author	Vandervorst, Wilfried
dc.contributor.author	Heyns, Marc
dc.contributor.imecauthor	Jayachandran, Suseendran
dc.contributor.imecauthor	Delabie, Annelies
dc.contributor.imecauthor	Caymax, Matty
dc.contributor.imecauthor	Loo, Roger
dc.contributor.imecauthor	Meersschaut, Johan
dc.contributor.imecauthor	Vandervorst, Wilfried
dc.contributor.imecauthor	Heyns, Marc
dc.contributor.orcidimec	Loo, Roger::0000-0003-3513-6058
dc.contributor.orcidimec	Meersschaut, Johan::0000-0003-2467-1784
dc.date.accessioned	2021-10-22T02:20:28Z
dc.date.available	2021-10-22T02:20:28Z
dc.date.issued	2014
dc.identifier.issn	0040-6090
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/24007
dc.identifier.url	http://www.sciencedirect.com/science/article/pii/S0040609013016908
dc.source.beginpage	36
dc.source.endpage	41
dc.source.journal	Thin Solid Films
dc.source.volume	557
dc.title	Chemical vapor deposition processes for the fabrication of epitaxial Si-O superlattices
dc.type	Journal article
dspace.entity.type	Publication
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