Publication:

Si1-xGex-channel PFETs: scalability, layout considerations and compatibility with other stress techniques

Date

2011
Proceedings Paper
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dc.contributor.authorEneman, Geert
dc.contributor.authorHellings, Geert
dc.contributor.authorMitard, Jerome
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorYamaguchi, Shinpei
dc.contributor.authorGarcia Bardon, Marie
dc.contributor.authorChristie, Phillip
dc.contributor.authorOrtolland, Claude
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorFavia, Paola
dc.contributor.authorBargallo Gonzalez, Mireia
dc.contributor.authorSimoen, Eddy
dc.contributor.authorCrupi, Felice
dc.contributor.authorKobayashi, Masaharu
dc.contributor.authorFranco, Jacopo
dc.contributor.authorTakeoka, Shinji
dc.contributor.authorKrom, Raymond
dc.contributor.authorBender, Hugo
dc.contributor.authorLoo, Roger
dc.contributor.authorClaeys, Cor
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorHellings, Geert
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorGarcia Bardon, Marie
dc.contributor.imecauthorChristie, Phillip
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorFranco, Jacopo
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecHellings, Geert::0000-0002-5376-2119
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecFranco, Jacopo::0000-0002-7382-8605
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-19T13:26:37Z
dc.date.available2021-10-19T13:26:37Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18887
dc.source.beginpage493
dc.source.conferenceDielectrics in Nanosystems -and- Graphene, Ge/III-V, Nanowires and Emerging Materials for Post-CMOS Applications 3
dc.source.conferencedate1/05/2011
dc.source.conferencelocationMontreal Canada
dc.source.endpage503
dc.title

Si1-xGex-channel PFETs: scalability, layout considerations and compatibility with other stress techniques

dc.typeProceedings paper
dspace.entity.typePublication
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