Publication:

Metal-containing materials as turning point of EUV lithography

Date

2015
Journal article
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dc.contributor.authorDe Simone, Danilo
dc.contributor.authorPollentier, Ivan
dc.contributor.authorVandenberghe, Geert
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.accessioned2021-10-22T18:52:50Z
dc.date.available2021-10-22T18:52:50Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25155
dc.identifier.urlhttps://www.jstage.jst.go.jp/article/photopolymer/28/4/28_507/_article
dc.source.beginpage507
dc.source.endpage514
dc.source.issue4
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.volume28
dc.title

Metal-containing materials as turning point of EUV lithography

dc.typeJournal article
dspace.entity.typePublication
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