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Cryogenic etching of porous organosilicate low-k materials: reduction of plasma induced damage
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Cryogenic etching of porous organosilicate low-k materials: reduction of plasma induced damage
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Date
2015
Meeting abstract
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Leroy, F.
;
Tillocher, T.
;
Zhang, Liping
;
Lefaucheux, P.
;
Yatsuda, K.
;
Maekawa, K.
;
de Marneffe, Jean-Francois
;
Baklanov, Mikhaïl
;
Dussart, R
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1926
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Acq. date: 2025-12-11
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Views
1926
since deposited on 2021-10-22
2
last month
Acq. date: 2025-12-11
Citations