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Thermal stability of rare earth oxides as high-k gate dielectrics

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dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorConard, Thierry
dc.contributor.authorDelabie, Annelies
dc.contributor.authorFranquet, Alexis
dc.contributor.authorLehnen, Peer
dc.contributor.authorNyns, Laura
dc.contributor.authorRichard, Olivier
dc.contributor.authorSwerts, Johan
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-16T20:36:47Z
dc.date.available2021-10-16T20:36:47Z
dc.date.embargo9999-12-31
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13047
dc.source.conference54th AVS International Symposium and Exhibition
dc.source.conferencedate14/10/2007
dc.source.conferencelocationSeattle, WA USA
dc.title

Thermal stability of rare earth oxides as high-k gate dielectrics

dc.typeProceedings paper
dspace.entity.typePublication
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