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Towards manufacturing a 10nm node device with complementary EUV lithography
Publication:
Towards manufacturing a 10nm node device with complementary EUV lithography
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Date
2013
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hermans, Jan
;
Dai, Huixiong
;
Niroomand, Ardavan
;
Laidler, David
;
Mao, Ming
;
Chen, Yongmei
;
Leray, Philippe
;
Ngai, Chris
;
Cheng, Shaunee
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1885
since deposited on 2021-10-21
2
last month
Acq. date: 2025-12-15
Citations