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Temperature and RF current sensor wafers for plasma etching
Publication:
Temperature and RF current sensor wafers for plasma etching
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Date
2012
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Milenin, Alexey
;
Demand, Marc
;
Boullart, Werner
;
Arleo, Paul
Journal
Journal of the Electrochemical Society
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1879
since deposited on 2021-10-20
Acq. date: 2025-12-15
Citations
Metrics
Views
1879
since deposited on 2021-10-20
Acq. date: 2025-12-15
Citations