Publication:
Atomic Layer Etching of Nickel Using N<sub>2</sub>/H<sub>2</sub> Plasma Exposure and Hexafluoroacetylacetone
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| cris.virtual.orcid | 0000-0001-5178-6670 | |
| cris.virtual.orcid | 0000-0003-3775-3578 | |
| cris.virtual.orcid | 0000-0002-5956-6485 | |
| cris.virtual.orcid | 0000-0001-5815-8765 | |
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| cris.virtualsource.orcid | 64be218b-7dd0-4e75-b728-aadcdf6705db | |
| dc.contributor.author | Ali, Ali Mohamed | |
| dc.contributor.author | Krieger, Guillaume | |
| dc.contributor.author | Soulie, Jean-Philippe | |
| dc.contributor.author | Knoops, Harm C. M. | |
| dc.contributor.author | Kessels, Wilhelmus M. M. | |
| dc.contributor.author | De Gendt, Stefan | |
| dc.contributor.author | Kundu, Souvik | |
| dc.contributor.author | de Marneffe, Jean-Francois | |
| dc.contributor.orcidext | 0000-0002-2925-8641 | |
| dc.contributor.orcidext | 0000-0003-3775-3578 | |
| dc.date.accessioned | 2026-07-27T14:16:07Z | |
| dc.date.available | 2026-07-27T14:16:07Z | |
| dc.date.createdwos | 2026 | |
| dc.date.issued | 2026 | |
| dc.description.wosFundingText | This work was partially financially supported by the Chips Joint Undertaking, through the European Union's Digital Europe (101183266) and Horizon Europe programs (101183277), as well as by the participating states Belgium (Flanders), France, Germany, Finland, Ireland, and Romania. We also extend our appreciation to imec Core Partners, Integration, Process Development, FAB, P-line, and the Metrology Team, as well as many others who have contributed to this work. The work at the TU/e has been carried out within the Open Technology Program with Project No. 19438, which is financed by the Netherlands Organization for Scientific Research (NWO). | |
| dc.identifier.doi | 10.1021/acsaelm.5c02655 | |
| dc.identifier.eissn | 2637-6113 | |
| dc.identifier.issn | 2637-6113 | |
| dc.identifier.pmid | MEDLINE:42147408 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/60001 | |
| dc.language.iso | eng | |
| dc.provenance.editstepuser | greet.vanhoof@imec.be | |
| dc.publisher | AMER CHEMICAL SOC | |
| dc.source.beginpage | 3834 | |
| dc.source.endpage | 3842 | |
| dc.source.issue | 9 | |
| dc.source.journal | ACS APPLIED ELECTRONIC MATERIALS | |
| dc.source.numberofpages | 9 | |
| dc.source.volume | 8 | |
| dc.subject.keywords | DEPOSITION | |
| dc.subject.keywords | H-2 | |
| dc.subject.keywords | N-2 | |
| dc.title | Atomic Layer Etching of Nickel Using N2/H2 Plasma Exposure and Hexafluoroacetylacetone | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| imec.internal.crawledAt | 2026-04-25 | |
| imec.internal.source | crawler | |
| imec.internal.wosCreatedAt | 2026-07-14 | |
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