Publication:

Scalability of stress induced by contact-etch-stop layers: a simulation study

Date

2007
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorEneman, Geert
dc.contributor.authorVerheyen, Peter
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorJurczak, Gosia
dc.contributor.authorDe Meyer, Kristin
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.date.accessioned2021-10-16T16:01:15Z
dc.date.available2021-10-16T16:01:15Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12125
dc.source.beginpage1446
dc.source.endpage1453
dc.source.issue6
dc.source.journalIEEE Trans. Electron Devices
dc.source.volume54
dc.title

Scalability of stress induced by contact-etch-stop layers: a simulation study

dc.typeJournal article
dspace.entity.typePublication
Files
Publication available in collections:
Articles