Publication:
Extended defect printability study for 100nm design rule using 193nm lithography
Date
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.author | Jonckheere, Rik | |
| dc.contributor.imecauthor | Philipsen, Vicky | |
| dc.contributor.imecauthor | Jonckheere, Rik | |
| dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
| dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
| dc.date.accessioned | 2021-10-14T22:47:17Z | |
| dc.date.available | 2021-10-14T22:47:17Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6718 | |
| dc.source.beginpage | 509 | |
| dc.source.conference | 22nd Annual BACUS Symposium on Photomask Technology | |
| dc.source.conferencedate | 3/10/2002 | |
| dc.source.conferencelocation | Monterey, CA USA | |
| dc.source.endpage | 519 | |
| dc.title | Extended defect printability study for 100nm design rule using 193nm lithography | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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