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Printability of topography in alternating aperture phase-shift masks

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dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorJonckheere, Rik
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2021-10-15T15:26:21Z
dc.date.available2021-10-15T15:26:21Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9424
dc.source.beginpage587
dc.source.conference24th Annual BACUS Symposium on Photomask Technology
dc.source.conferencedate13/09/2004
dc.source.conferencelocationMonterey, CA USA
dc.source.endpage595
dc.title

Printability of topography in alternating aperture phase-shift masks

dc.typeProceedings paper
dspace.entity.typePublication
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