Publication:

Challenges and approaches in advanced Fin patterning

Date

2019
Proceedings Paper
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dc.contributor.authorZhang, Liping
dc.contributor.authorHellin, David
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.date.accessioned2021-10-28T00:44:39Z
dc.date.available2021-10-28T00:44:39Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34538
dc.source.conferencePESM-2019 Plasma Etch and Strip in Microelectronics
dc.source.conferencedate20/05/2019
dc.source.conferencelocationGrenoble France
dc.title

Challenges and approaches in advanced Fin patterning

dc.typeProceedings paper
dspace.entity.typePublication
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